Pulsed Laser Deposition and Thermal Evaporator system

Model :
PLD – T
Description :
PLD – T is a high vacuum thin film deposition system enables to deposit different materials by both Pulsed Laser Deposition and thermal evaporation technique. It can deposit complex materials and crystalline structures onto substrates with very little setup involved Pulsed Laser Deposition technique leads to efficient, none-thermal ablation and preserves the stoichiometry of the target materials. By applying this method it could deposit materials such as nitrides, oxides, superlattices, polymers, composites. Features Target manipulator with adjustable rotation speed. 3 thermal sources and special feedthrough. The quartz crystal monitoring system for real-time thickness measurement (1 nm precision). Intuitive touch screen to control the coating process and rapid data input. User-friendly software that can be updated via the network. Equipped with a rotary sample holder. Equipped with electronic shutter. Equipped with motorized boat selection. 500 °C substrate heater. Two-year warranty.
Company name :
Packaging :
Wheeled Metal Case
Minimum order :
1
Standard :
iso 9001, CE
Payment type :
T/T payment in advance
Source :
Tehran
Post type :
EXW

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