Sputtering and Thermal evaporation process in a compact system
High vacuum coating suitable for oxidizing and non-oxidizing metals
Equipped with DC and RF power supplies suitable for metals, semiconductors and dielectrics.
Two water cooled angled, magnetron cathodes suitable for producing alloy films and. multilayer deposition.
One thermal source installation
Two quartz crystal monitoring system for real time thickness measurement (1 nm Manual or automatic Timed and Thickness deposition
Intuitive touch screen to control coating process and rapid data input
User friendly software that can be updated via network
• Equipped with electronic shutter.
Equipped with rotary sample holder with ability to tilt in direction of cathodes
500 °C substrate heater
300 V DC substrate bias voltages
Unlimited deposition time without breaking vacuum